找词语>英语词典>etching翻译和用法

etching

英 [ˈetʃɪŋ]

美 [ˈetʃɪŋ]

n.  蚀刻画; 蚀刻术; 蚀刻法
v.  蚀刻,凿出(玻璃、金属等上的文字或图画); (脸上)流露出; 铭刻; 画出…的轮廓
etch的现在分词

复数:etchings 现在分词:etching 

GRE化学

BNC.16752 / COCA.14836

牛津词典

    noun

    • 蚀刻画;蚀刻术;蚀刻法
      a picture that is printed from an etched piece of metal; the art of making these pictures

      柯林斯词典

      • 蚀刻版画
        Anetchingis a picture printed from a metal plate that has had a design cut into it with acid.

        英英释义

        noun

        • making engraved or etched plates and printing designs from them
            Synonym:engraving
          1. an etched plate made with the use of acid
            1. an impression made from an etched plate

              双语例句

              • The Study of Porous InP Formed by Electrochemical Etching;
                对易获得重现性好的化学蚀刻法进行了探研。
              • This is generally printed using an etching press.
                这通常是使用一个蚀刻印刷出版社。
              • The method also includes forming a recessed region in the cell array region by etching the semiconductor substrate.
                该方法还包括通过刻蚀该半导体衬底,在单元阵列中形成凹陷区。
              • Intaglio engraving of rejectamenta acid etching chemicals.
                凹版雕刻用酸性蚀刻化学品废弃物。
              • Electrochemical etching and replating process
                电化腐蚀和电镀工艺
              • HF vapor-phase etching was studied under different temperatures and different conditions for fabrication of suspended nano structure.
                针对纳米悬浮结构的制作,对不同温度和不同气相条件下的氢氟酸(HF)气相刻蚀进行了研究。
              • A method to study the sacrificial layer etching in nanometer is proposed after lots of experiments.
                通过大量的实验研究,建立了一套纳米量级牺牲层腐蚀行为的实验研究方法。
              • UV lithography, silicon etching and soft lithography were adopted to fabricate micropillar arrayed cell culture substrates.
                以紫外光光刻、硅蚀刻及软光刻技术制备了微柱阵列型细胞培养基底。
              • Mary is very keen on etching.
                玛丽很喜爱蚀刻艺术。
              • Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
                因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。